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Title Resonant infrared pulsed laser deposition of cyclic olefin copolymer films
Authors Senthil Singaravelu, John Klopf, Kenneth Schriver, HyeKyoung Park, Michael Kelley, R. Haglund Jr.
JLAB number JLAB-ACE-13-1787
LANL number (None)
Other number DOE/OR/23177-3000
Document Type(s) (Journal Article) 
Associated with EIC: No
Supported by Jefferson Lab LDRD Funding: No

Compiled for Applied Physics A
Volume 114
Issue 4
Page(s) 1285-1293
Publication Abstract: Barrier materials on thin-film organic optoelectronic devices inhibit the uptake of water, oxygen, or environmental contaminants, and fabricating them is a major challenge. By definition, these barrier layers must be insoluble, so the usual routes to polymer- or organic-film deposition by spin coating are not problematic. In this paper, we report comparative studies of pulsed laser deposition of cyclic olefin copolymer (COC), an excellent moisture barrier and a model system for a larger class of protective materials that are potentially useful in organic electronic devices, such as organic light-emitting diodes (OLEDs). Thin films of COC were deposited by resonant and nonresonant infrared pulsed laser ablation of solid COC targets, using a free-electron laser tuned to the 3.43 ?m C?H stretch of the COC, and a high-intensity nanosecond Q-switched laser operated at 1064 nm. The ablation craters and deposited films were characterized by scanning-electron microscopy, Fourier-transform infrared spectrometry, atomic-force microscopy, high-resolution optical microscopy, and surface profilometry. Thermal-diffusion calculations were performed to determine the temperature rise induced in the film at the C?H resonant wavelength. The results show that resonant infrared pulsed laser deposition (RIR-PLD) is an effective, low-temperature thin-film deposition technique that leads to evaporation and deposition of intact molecules in homogeneous, smooth films. Nonresonant PLD, on the other hand, leads to photothermal damage, degradation of the COC polymers, and to the deposition only of particulates.
Experiment Numbers: other
Group: Mechanical Engineering
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