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Title Characterization of NbTiN Thin Film Structures
Authors David Beverstock, Vera Smolyaninova, Michael Kelley, Anne-Marie Valente
JLAB number JLAB-ACC-19-3163
LANL number (None)
Other number DOE/OR/23177-6248
Document Type(s) (Meeting) 
Associated with EIC: No
Supported by Jefferson Lab LDRD Funding: No
Funding Source: Nuclear Physics (NP)
 

Meeting
Abstract compiled for AVS 66th International Symposium and Exhibition
Publication Abstract: Approaching the bulk Nb material RF performance limits has urged development of alternative superconducting materials for superconducting radio frequency (SRF) accelerator cavities for further performance enhancement. A promising theory has predicted that thin film structures of superconductor-insulator-superconductor (SIS) [1] can delay magnetic flux penetration in accelerator cavities to higher fields. A candidate superconductor for the SIS structures is NbTiN. A few key aspects of SIS structures development are high quality individual layers, sharp interfaces and optimum thickness for first flux penetration (Hfp) delay. High quality monocrystalline NbTiN films are deposited by reactive DC magnetron sputtering. In a parallel development, interface quality was assessed by depositing bilayers of 3 nm NbTiN with ~1 nm AlN repeated up to 16 times with no increase in roughness of the structure. The stacked layers form a metamaterial, which could exhibit Tc greater than bulk NbTiN [2]. This contribution presents the characterization of the surface, material and superconductivity of NbTiN with concentration on the Hfp enhancement for 200 to 5 nm films and multilayer nanostructures.
Experiment Numbers:
Group: SRF Research & Dev
Document: docx
DOI:
Accepted Manuscript:
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